查询词典 lithography

This article studies the design of Alignment system based on video and confocal, Mask-Panel Alignment is one of the threes key technologies (projectionlens, aligner, wafer stage)in lithography.

针对目前我们研究的激光投影光刻机对高分辨力和高衬度的需要，设计了一套基于视频图像对准原理的激光投影光刻对准系统。

Having developed an understanding of basics, intellisuite is introduced in the context of mems cad with the aim of using it in the design and simulation of a simple mems device which will be subsequently fabricated using the clean room facility ie mask aligner, electron beam lithography, wet bench for chemical etching, sputtering etc.

制订了一项谅解的基础， intellisuite介绍了在微机电系统计算机辅助设计的目的是利用它在设计和模拟一个简单的mems器件将在随后采用清洁房间设施即遮罩同步，电子束光刻，湿法化学腐蚀板凳，溅射等先决条件：英国104 ， 103太太，太太， 221 ， 231太太，太太312 。

The invention provides a UV below 200 nm lithography method utilizing mixed calcium strontium fluoride crystals.

本发明提供了波长在200纳米之下的UV平版印刷方法，它使用了混合的氟化钙锶晶体。

"Work" means the literary and/or artistic work offered under the terms of this License including without limitation any production in the literary, scientific and artistic domain, whatever may be the mode or form of its expression including digital form, such as a book, pamphlet and other writing; a lecture, address, sermon or other work of the same nature; a dramatic or dramatico-musical work; a choreographic work or entertainment in dumb show; a musical composition with or without words; a cinematographic work to which are assimilated works expressed by a process analogous to cinematography; a work of drawing, painting, architecture, sculpture, engraving or lithography; a photographic work to which are assimilated works expressed by a process analogous to photography; a work of applied art; an illustration, map, plan, sketch or three-dimensional work relative to geography, topography, architecture or science; a performance; a broadcast; a phonogram; a compilation of data to the extent it is protected as a copyrightable work; or a work performed by a variety or circus performer to the extent it is not otherwise considered a literary or artistic work.

本著作」指依据本授权条款提供的文学及艺术创作，包含但不限於以任何方式或形式表达之文学、科学及艺术范围之制作物，例如：书籍、小手册及其他撰著；演讲、演说、布道及其他类似同性质之著作；戏剧著作或歌剧著作；舞蹈著作或默剧；含歌词或不含歌词之音乐作曲；电影著作及其他藉由与电影摄影技术类似之程序表达之同类著作；素描、绘画、建筑、雕塑、雕刻或版画之著作；摄影著作及其他藉由与摄影技术类似之程序表达之同类著作；应用艺术著作；插图、地图、设计图、素描及地理、地形、建筑或科学相关立体著作；表演；广播；录音物；和可受著作权保护的资料编辑；或不属於文学或艺术创作的各式表演人或马戏团表演人所表演的创作。

H. "Work" means the literary and/or artistic work offered under the terms of this License including without limitation any production in the literary, scientific and artistic domain, whatever may be the mode or form of its expression including digital form, such as a book, pamphlet and other writing; a lecture, address, sermon or other work of the same nature; a dramatic or dramatico-musical work; a choreographic work or entertainment in dumb show; a musical composition with or without words; a cinematographic work to which are assimilated works expressed by a process analogous to cinematography; a work of drawing, painting, architecture, sculpture, engraving or lithography; a photographic work to which are assimilated works expressed by a process analogous to photography; a work of applied art; an illustration, map, plan, sketch or three-dimensional work relative to geography, topography, architecture or science; a performance; a broadcast; a phonogram; a compilation of data to the extent it is protected as a copyrightable work; or a work performed by a variety or circus performer to the extent it is not otherwise considered a literary or artistic work.

h。 「本著作」指本授权条款下提供的文学及艺术著作，包含但不限於以任何方式或形式表达之文学、科学及艺术范围之制作物，例如：书籍、小手册及其他撰著；演讲、演说、布道及其他类似同性质之著作；戏剧著作或歌剧著作；舞蹈著作或默剧；含歌词或不含歌词之音乐作曲；电影著作及其他藉由与电影摄影技术类似之程序表达之同类著作；素描、绘画、建筑、雕塑、雕刻或版画之著作；摄影著作及其他藉由与摄影技术类似之程序表达之同类著作；应用艺术著作；插图、地图、设计图、素描及地理、地形、建筑或科学相关立体著作；表演；广播；录音物；和可受著作权保护的著作同样受保护的资料编辑物；或种种表演人或马戏团表演人表演的不被视为文学或艺术著作的著作。

The synchrotron radiation light source used in LIGA technique for deep lithography is becoming more and more important because of its unique qualities-(1) high brightness, usually being 10〓~10〓 times of common X-ray light source;(2) good collimate, the angle of divergence of synchrotron radiation light source could be compared with that of laser light source.

由于同步辐射光源具有（1）亮度高，比一般X射线源高10〓~10〓倍，（2）准直性好，辐射张角可以与激光相比的特点，因而，利用同步辐射光源作为LIGA技术中深度光刻光源正日益受到重视。

It utilized a concave lens to reflect the incident light in lithography process and controls the exposure dosage in photoresist. Micro-pyramid array in photoresist is then developed onto the substrate.

利用凹透镜改变曝光机入射光的角度，控制曝光剂量於光阻中，以成型出四角锥柱微结构，并将其应用在导光板制造技术上。

The deflection system of an electron beam lithography tool is used to control deflection scanning of electron beam.

电子束曝光机的偏转系统控制电子束偏转扫描。

Five novel torsion-mirror optical actuators including double-beam thickness differential structure with single torsional axis, double flexible folded-beam structure with single torsional axis, double-beam vertical torsion comb structure with single torsion axis, four-beam differential compound-micromirror structure with double torsional axis and the combined structure of the four basis forms above, are brought forward. All of these devices could be fabricated by the same silicon micromachining process we have developed. The deformation compensation design with local enhancement for the thin torsional beam which is the key structure of these devices is also put forward to improve the reliability. The three-dimension solid model and two-dimension reduced order model of the torsion-mirror optical actuator are established and then the numerical simulations for evaluating the device characteristics of the statics, dynamics, electrostatic field, mechanical and electrostatic coupling, fluid and solid coupling are carried out to optimize the structure design. Furthermore, three optical fibre clamping structures which could be integrated monolithicly are designed and analyzed to improve the optical coupling capability. 4. Three flexible process flows combined with bulk silicon micromachining and surface silicon micromachining are brought forward to fabricate these novel single-crystal silicon or polysilicon torsion-mirror optical actuators by using the same lithography masks for both SOI wafer and regular silicon wafer. A series of important process experiments are carried out to optimize the process parameters and the process flows. Some novel and typical process phenomena which occurred during the microfabrication are analyzed and then the corresponding solutions are put forward. 5. A MEMS dynamic testing system which exploit blur image synthetic technique, stroboscopic image matching technique, stroboscopic mirau microscopic interferometry technique and microscopic laser dopper vibrometer technique is set up to measure three-dimension and six-freedom micro motions of any MEMS devices with nanometer resolution.

在对硅微机械扭转镜光致动器的光机电特性系统地理论研究的基础上提出了硅微机械扭转镜光致动器的结构设计准则。3、提出了单轴双梁厚度差分结构、单轴双柔性折叠梁结构、单轴双梁垂直扭转梳齿结构、双轴四梁差动复合微镜结构以及以上四种基本结构组合后的衍生结构等五种工艺加工技术兼容的新型的硅微机械扭转镜光致动器，对器件关键结构薄厚度、高耐疲劳扭转梁进行了局部加强的变形补偿设计，建立了器件的三维实体模型以及两维降阶模型，对提出的新结构硅微机械扭转镜光致动器进行了系统的静力学、动力学、静电场、力电耦合和流体固体耦合的建模仿真与优化设计，同时设计并分析了三种可实现单芯片集成的弹性光纤定位夹紧结构。4、提出了组合体硅微加工技术与表面硅微加工技术、兼容同一套光刻版图、可分别基于SOI 晶片和普通Si 晶片、适应于制造提出的各种新结构单晶硅和多晶硅硅微机械扭转镜光致动器的三套柔性加工工艺流程，开展了一系列重要工艺步骤的单项工艺试验，对工艺流程与工艺参数进行了优化，针对加工过程中出现的具有普遍意义的典型工艺问题进行了讨论和分析，并提出了解决方法。5、创新性地将模糊图像合成技术、频闪图像匹配技术、频闪Mirau 显微干涉技术与显微激光多普勒测振技术有机结合，建立起了一套周期运动测量与瞬态运动测量相结合、单点运动测量与全视场运动测量相结合、满足不同MEMS 器件各种动态测试要求的集成的MEMS 三维六自由度微运动精密测量系统。

Nano-imprint lithography drum skin abrasion or drop, causing the paper punches-drum so that the poor contact dot untrue.

压印滚筒磨损或掉皮，造成压印滚筒与纸张接触不良，使得网点不实。

I'm strongly against the death penalty — it's an eye for an eye.

我不赞成死刑——这是以牙还牙的报复行为。

And to get you the support you need, we're enlisting all elements of our national power: our diplomacy and development, our economic might and our moral suasion, so that you and the rest of our military do not bear the burden of our security alone.

并给你们所须的支援，我们正徵召国家所有各种的力量：我们的外交及发展，我们的经济力量与道德劝说，所以你们与其他军人不须要孤独地负起国家安全的责任。