辉光放电

Compared with the conventional cold cathode glow discharge, the hot cathode glow discharge is a new type of gas discharge. It has many new characters, one of which is that the discharge current is quite high-about

相对于常规冷阴极辉光放电而百，热阴极辉光放电是一种新型放电形式，具有许多新的特性，其中重要一点是具有较高的放电电流(6.0~10.0A)。

Comparing with the conventional cold glow discharge, the hot cathode glow discharge is a new type of gas discharge.

相对于常规冷阴极辉光放电而言，热阴极辉光放电是一种新型放电形式，对于它的工作特性，我们以前知之甚少，对于放电特性与制备工艺之间的关系也没有掌握，影响了沉积工艺的优化，没有达到最佳沉积效果。

Here, in this paper, the special properties of hot cathode glow discharge are studied from the view of hot cathode and glow discharge plasma.

相对于常规冷阴极辉光放电而言，热阴极辉光放电是一种新型放电形式，对于它的工作特性，我们以前知之甚少，对于放电特性与制备工艺之间的关系也没有掌握，影响了沉积工艺的优化，没有达到最佳沉积效果。

Comparing with the conventional cold glow discharge, the hot cathode glow discharge is a new type of gas discharge. The discharge characteristics and their relation to diamond film deposition process are almost unknown to us.

相对于常规冷阴极辉光放电而言，热阴极辉光放电是一种新型放电形式，对于它的工作特性，我们以前知之甚少，对于放电特性与制备工艺之间的关系也没有掌握，影响了沉积工艺的优化，没有达到最佳沉积效果。

Large current glow discharge has a strong tendency to transform to arc discharge. This paper focuses our attention on the factors affecting the stability of large current hot cathode glow discharge. The research results show that the cathode temperature, the cathode surface state and the size and place disposition between cathode and anode have influences on the stability of glow discharge, respectively.

大电流辉光放电具有较强的向弧光放电转化趋势，本文研究了影响大电流热阴极辉光放电稳定工作的因素，结果表明，阴极温度、表面形貌、阴阳极位置和尺寸配置关系等对辉光放电的稳定性均有不同程度的影响。

The key difference between hot cathode glow discharge and conventional cold cathode glow discharge is that the cathode is in a hot state with the temperature about 700～1600℃ in a hot cathode glow discharge.

热阴极直流辉光放电区别于常规冷阴极辉光放电的关键之处在于，在辉光放电过程中，阴极处于700-1600℃的"热"状态，并且放电电流大，工作气压高。

Arc-glow plasma depositing technique is a new surface coating method. With the help of vacuum arc discharge, a cold cathode arc source continually emits ion beams of coating elements with high currency density and high ionizing ratio.Upon the ion bombard and diffusion work on, the surfaces of the parts form deposited layers, diffusion layers. In this study, a commercial magnesium alloy AZ91 was coated with Ti film layer.

加弧辉光离子渗镀技术将辉光放电与弧光放电有机地结合起来，利用辉光放电空心阴极效应使工件迅速升温，同时在真空容器壁上设置一个或多个金属阴极电弧靶源，利用真空电弧放电而不断地发射出高能量、高电流密度、高离化率的欲渗金属离子流，依靠扩散和离子轰击作用快速渗入工件表面层，在工件表面可以形成渗层、镀层、渗镀结合层。

The key difference between hot cathode glow discharge and conventional cold cathode glow discharge is that the cathode is in a hot state with the temperature about 700～1600℃ in a hot cathode glow discharge.

热阴极直流辉光放电区别于常规冷阴极辉光放电的关键之处在于，在辉光放电过程中，阴极处于700-1600℃的&热&状态，并且放电电流大，工作气压高。

The diamond film deposition experiments with hot cathode glow discharge PCVD shows that the cathode temperature has no apparent influence on deposition rate and film quality. With the increase of gas pressure, the gas density, electron temperature, gas dissociation rate in the plasma region change differently.

在热阴极辉光放电PCVD沉积金刚石膜中，适当的阴极温度是保证大电流、高气压辉光放电稳定工作的必要条件，它影响着辉光放电阴极位降区的放电性质，但对金刚石膜的沉积速率和膜品质基本没有影响。

Hot cathode glow discharge chemical vapor deposition is a new method to deposit high quality diamond films with high deposition rate.

中文题名热阴极辉光放电及其等离子体化学气相沉积金刚石膜研究副题名外文题名 Study of hot cathode glow discharge and its plasma chemical vapor deposition of diamond films 论文作者白亦真导师金曾孙教授学科专业凝聚态物理研究领域\研究方向学位级别博士学位授予单位吉林大学学位授予日期2001 论文页码总数139，10页关键词金刚石膜薄膜制备热阴极辉光放电等离子体化学气相沉积馆藏号BSLW /2003 /TB43 /1 热阴极辉光放电等离子体化学气相沉积是我们建立的快速沉积高品质金刚石膜的新方法。

If you are unfortunate enough to the lovelorn, please tell me, I will help you out, really, please contact me!

如果你不幸失恋了，请告诉我，我会帮助你摆脱困境，真的，请联系我啦！

China's plan to cut energy intensity by 20 percent and pollutant discharges by 10 percent between 2006 and 2010 is a case in point.

中国计划在2006年到2010间降低20%的能源强度和减少10%的主要污染物排放，就是一个这样的例子。