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Under the divertor configuration running model in HL-2A, the Z-axis direction profiles of the electron temperature, plasma density, floating potential and net current of the grounded probe has been measurements at inner and outer divertor target plate of same poloidal section using the purpose-built array of flush-mounted Langmuir probes.

HL-2A装置边缘等离子体诊断是通过磁力传动的马赫/雷诺协强/朗缪尔10探针组进行研究。10探针组是安装在可径向向里和向外移动,并可绕轴旋转3600的传动杆上,用于测量主等离子体边缘的温度,密度,悬浮电位,空间电位,径向和极向电场,雷诺协强,径向和极向等离子体流速及其径向分布。

A 2D PIC model was used to simulate the PIII process for a planar target. The simulation results in one whole pulse show that the sheath expands with a decreasing speed and the sheath shape would change form elliptically cylindrical to circularly cylindrical. The dose distribution of ion implantation in the target surface is not uniform, and the concentration depth profiles of retained dose are considerably different, in different positions of the target.

本论文采用二维粒子模拟方法对等离子体离子浸没注入技术进行了模拟研究,在一个完整脉冲时段内,等离子体离子浸没注入平板靶的模拟过程表明:等离子体鞘层的扩展先快后慢,鞘层形状由椭圆柱形向圆柱形演化;注入离子剂量在靶表面的分布是非均匀的;在靶的不同位置注入的离子在改性层中的浓度深度分布有显著差别。

In order to optimize the parameters of dielectric barrier-discharge plasmas, the emission spectrum of second transition line of oxygen and nitrogen under normal temperature and pressure was measured with a grating spectrometer.

为了对绝缘阻挡放电等离子体进行参数优化,以常压DBD等离子体为研究对象,在常温常压下使用可见光光栅光谱仪对等离子体发光光谱进行了诊断,得到了N2和O2的第二正带跃迁谱线。

Investigation on dynamics of the emission spectrum from the plasma produced by laser ablation of metal surface is one of most effective experimental methods to explore the laser induced plasma dynamics.

激光诱导等离子体的形成过程,以及电子密度和电子温度等主要描述等离子体特性参量的动力学特性,是激光等离子体研究的主要内容。

We investigate the effects of the configurations of the chamber and the coil of an inductively coupled plasma etcher and the process parameters on the homogeneity of plasma distribution.Using the modules of plasma,electromagnetic field,etc.in the commercial software CFD-ACE+,a two-dimensional discharge model of an ICP etcher was built.

为研究感应耦合等离子体刻蚀机腔室与线圈结构以及工艺参数对等离子体分布均匀性的影响,基于商业软件CFD-ACE+中等离子体与电磁场等模块建立了ICP刻蚀机二维放电模型。

Plasma System 7200 is a low pressure RF plasma system designed for general purpose cleaning and surface modification.

7200等离子体是一台用于一般等离子体清洗和表面改性的低压射频等离子体设备。

The recent efforts to obtain the homogenous atmospheric pressure glow discharge are also discussed.

通过对比各种大气压等离子体源的特点,可以看到等离子体射流产生的等离子体均匀稳定。

The average electron density in the linear attenuation zone is about 10^-5 of neutral particle density, and can diffuse over a wide rarea, The conclusion will supply some valuable references to the research of electromagnetic wave and artificial plasma interaction, the plasma invisibleness research of missile and special aerocraft,and the design of artificial plasma source.

平缓衰减区中的平均电子密度约为中性分子密度的十万分之一。并且可以覆盖较大范围。这些结果对于电磁波与人工等离子体相互作用的研究、导弹和空间飞行器的等离子体隐身研究及人工等离子体发生器的设计有一定的参考价值。

It also covers two-fluid hydrodynamic plasma models, wave propagation in a magnetic field, kinetic theory, Vlasov plasma model, electron plasma waves and Landau damping, ion-acoustic waves, and streaming instabilities.

它也涵盖双流体的流体动力学的等离子体模型、磁场内的波传播现象、动力理论、Vlasov等离子体模型、等离子体波、蓝道阻尼、离子声波和串流不稳定性。

Meantime, due to there are many fluctuating modes in plasma, so it is able to bring a new beam-wave interaction mechanism, by it people can invent some new type high power microwave apparatus.

高功率微波装置中的电流密度很大,空间电荷效应强烈,影响了功率的提高,克服空间电荷效应的有效方法是在高功率微波器件中填充等离子体,由于等离子体对空间电荷的中和作用,传输电流会大大提高,从而大幅度提高输出功率,同时由于等离子体中存在多种波动模式,有可能带来新的注波互作用机制,发展新型的高功率微波器件。

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