真空放电

It is manufactured under high vacuum conditions use plasma discharger basic theory to uniformity spatter the SiO2 thin film and ITO thin film on the ultra thin float glass.

它是在高真空环境下，运用等离子放电的基本原理，在超薄浮法玻璃上均匀地溅射上SiO2和ITO薄膜而得到的。

It consists of the main pumping system, pumping divertor and glow discharge cleaning system.

它由真空主抽气系统、抽气偏滤器、直流辉光放电清洗系统组成。

Compared with other gas discharge switches, such as gas spark gap, vacuum switch, hydrogen thyratron and ignitron, the parameters of PSS, such as hold-off voltage, peak current, rate of current rise, lifetime, time delay, jitter, have been greatly improved.

伪火花开关与其它气体放电开关如高气压火花间隙、真空开关、氢气闸流管及引燃管等相比，开关的各项参数如耐受电压、峰值电流、电流上升陡度、寿命、时延和抖动都有了较大改善。

In the experiment, a powder pressedboard whose concentration of W, Mo, Co was 35%, 20%, 45% seperately was regarded as a source pole. Under the hollow cathode effection of incordinate voltage, the Ar atom was ionized to Ar+. Then the source pole and the specimen one were cleaned by a great amount of Ar+. Their temperature was increased to about 1100℃.

利用不等电位空心阴极放电效应，真空条件下被电离的Ar~+离子同时轰击源极和工件极，源极上的合金元素被溅射出来，在强烈的电场作用下，吸附到受轰击而得到清洁的工件表面上。

Our products, with specially-made screw type connection, are designed for all standard lamp holder and are very convenient to use.

高频放电无极灯主要由高频激励源、功率耦合器和灯泡三部分组成，是集电子技术、光电技术、真空技术为一体的高新技术产品。

RCAE1047 will be stable in arc discharge at higher vacuum condition and lower arc current, especially for pure Zr target.

RCAE1047可以在高真空和低电流条件下稳定弧光放电工作，特别是采用纯锆靶材时。

Ion source Vacuum arc discharge Plasma Ion beam

离子源；真空弧放电；等离子体；离子束

Coldplasma chemical vapor deposition is highly competent for low temperature fabrication, but low pressure incorporated with sophisticated discharge and vacuum systems has mainlybeen adopted.

冷等离子体化学气相沉积是一种非常合适的低温型制备方法，但大多需要复杂的放电装置和真空系统。

C. discharge setup, vacuum ultraviolet spectral radiations in range of 120-200nm for the He H2 and N2 gases have been investigated. The relative radiation intensity as a function of the discharge current (100-600mA) and the influence of the gas pressure on it have been shown.

研究了He、H_2、N_2在120nm～20Onm范围内该装置的真空紫外辐射特性，获得了100～600mA电流范围内的辐射强度与放电电流的关系，以及充气气压变化对它的影响。

The advantages of vacuum sintering and hot isostatic pressing and spark plasma sintering are summarized.

总结了真空烧结+热等静压处理和放电等离子烧结的特点。

What are your goals and strategies for growth?

你的成长目标和策略是什么？

And unto the angel of the church in Sardis write; These things saith he that hath the seven irits of God, and the seven star I know thy works, that thou hast a name that thou livest, and art dead.

3：1 你要写信给撒狄教会的使者，说，那有神的七灵和七星的，说，我知道你的行为，按名你是活的，其实是死的。