查询词典 sputtering

Nickel chromium alloy was cheaper than nickel, and its sputtering aggradation velocity was more than that of nickel, so the immediacy costs of sputtering nickel chromium alloy electrode was less than that of sputtering nickel electrode.

镍铬合金价格低于镍金属，溅射沉积速率也比镍金属要快，所以溅射镍铬电极的直接成本低于溅射镍电极。

Investigation was made of the sputtering rate in glow discharge lamp with re-lation to constituent of 25 different specimens of 6 binary systems, namely, Cr-Fe, Bi-Sb,Cu-Zn, Ag-Cu, Al-Zn and Cd-Sn, by measuring mass loss after each sputtering under con-stant Ar pressure and voltage applied. The correlation, in general, between sputtering rate andconcentration of constituent of these non-intermetallic binary alloys obeys the hyperbolic lawunder steady state, yet may be approximately regarded as linear only on certain special condi-tion if the two components of the alloys with similar sputtering rates.

在恒定气压和电压条件下，用测量溅射减量的方法，系统研究了Cr—Fe，Bi-Sb，Cu—Zn，Ag—Cu，Al-Zn和Cd—Sn六个系统的25个试样在辉光放电灯中溅射率与组分的关系结果表明；阴极溅射在稳态时，二元合金的溅射率与组元浓度的普遍关系是双曲线，只有在某些特殊情况下，两组元的溅射率相差不大时，可以近似看成线性关系。

Testing results showed that in a sputtering cycle the sputtering time for Cu/Ga target has greatest effect on the final element distributi

实验中发现，在一个溅射周期中，Cu/Ga合金靶溅射时间对最后成分影响最大，其次是In靶溅射时间，非溅射时间的长短对成分也有影响。

Testing results showed that in a sputtering cycle the sputtering time for Cu/Ga target has greatest effect on the final element distribution and that for In target is the next.

通过可变占空比的电源控制器实现对Cu/Ga合金靶以及In靶溅射时间的控制，进而实现对最后元素配比的控制。

In chapter 2, we systematically introduced the theory and process of radio frequency magnetron sputtering and ion beam deposition sputtering.

第二章较为系统地介绍了溅射机理以及磁控溅射镀膜和离子束溅射镀膜机理和工艺特点，薄膜的沉积过程。

Vanadium oxide thin films deposited on slide glass substrates are prepared by facing-target magnetron sputtering.The effect of sputtering conditions on temperature coefficient of resistance is analyzed by orthogonal experiment,and the optimum process recipes are achieved,including Ar∶O2=48∶0.4,gas pressure is 2 Pa,substrate temperature is 27 ℃,sputtering power is 180 W.

利用对靶磁控溅射法在玻璃基片上制备VOx薄膜，采用正交实验方法研究了镀膜条件对VOx薄膜电阻温度系数的影响，得到优化的镀膜工艺参数，主要包括Ar∶O2为48∶0.4、工作压力恒定为2 Pa、基底的温度为室温27℃、溅射功率保持在180W，在此基础上，进行不同温度条件的真空退火，得到薄膜TCR在-2.5%~-4.5%范围。

In this study, the ZnO thin films were deposited onto Si (100) substrate by ratio frequency sputtering with various RF power at 50, 100, 150, 200, and 300 W and the surface morphologies, crystalline structural, and nanomechanical properties of ZnO thin films were examined.

本研究利用射频磁控式溅镀(RF-sputtering)法於矽(100)基材上沉积高品质氧化锌薄膜，在实验中改变溅镀功率(50、100、150、200、以及300 W)来观察其对氧化锌薄膜表面形貌、晶格结构、及奈米机械性质的影响。

Design the structure of high performance Low-E film including its material and thickness of every layer according to basic optical theory. Carry out an innovative work to calculate its optical performance by characteristic matrices and optical admittance. Compare the results with those we get by traditional measurement.3. Prepare Low-E films with RF magnetron controlled reactive sputtering. The result shows that in the visible region (380nm-780nm), the highest transmittance is 82.4% while the average value is 75%. In the NIR region (780nm-2500nm), the average transmittance is 16.2%. These characters can fit the demand of the glass used in architecture and cars, and also in other applications.4. We novelly use the material Titanium as protective layer to solve the problem that Ag layer would disappear when depositing the second TiO_2 layer. As the protective layer, Ti does not increase the number of targets so as to lower the costs. The thickness of the protective layer Titanium is adjusted by controlling of sputtering time. Results shows the Low-E films get the best optical character when the sputtering time of Titanium is 20 seconds5. We novelly proposed a new transmittance quality factor Q=_·(?_-__ to evaluate the performances of Low-E films, which makes it easier to judge the qualities of Low-E film.6. The photocatalysis of Titanium dioxides is researched and introduced into Low-E films. Sb-doped TiO_2 thin films are prepared. Its photocatalysis and hydrophilicity are measured.

论文的工作主要有：1、总结了低辐射薄膜的制备方法，性能，以及国内外最新研究进展和应用，并对两种类型的低辐射薄膜进行了比较。2、从光学基本理论开始，设计了离线低辐射薄膜的结构，包括每一层的材料和厚度，并创新性的用特性矩阵和光学导纳理论计算了该离线膜的光学性能，利用软件对其进行了仿真，与实际制备的薄膜所测量的性能相比较。3、完成在实验室仪器上制备低辐射薄膜，掌握其工艺条件，解决了超薄金属膜的制备问题，所制备的低辐射薄膜在可见光区(380hm-780hm)最高可达82.4%，平均透射率为75%；在近红外区(780nm-2500nm)的平均透射率为16.2%，其性能达到建筑物幕墙玻璃，汽车前挡玻璃等应用标准，并为进一步的大规模生产打下基础。4、针对中间银层在镀上层膜时易被氧化这一工艺难题，本研究创新性的提出用Ti膜作为保护膜，没有增加新的靶材，提高了生产效率，并节约了生产成本。

The invention uses the normal glass as the basal board , the studded target made of the indium metal mixing into molybdenum or tungstenic, and applies the responsive direct current magnetron sputtering technique under the condition of the basal board temperature equals room temperature, and also, under the appropriate state for the sputtering pressure, the oxygen partial pressure, the sputtering current, and the sputtering voltage to achieve the non-crystal structure In2O3:M film.

本发明以普通玻璃为基板，利用铟金属掺钼或钨的镶嵌靶，在基板温度为室温的条件下采用反应直流磁控溅射技术，在适当的溅射压强、氧分压、溅射电流和溅射电压的条件下制备获得具有非晶结构的In2O3：M薄膜。

We would like to know what type of coating you use on your Absorber panels, whether it is Selective Black Chrome on Nickel or Sputtering.

我们想知道你们的吸收板用的是什么类型的包料，是否可以在黑铬，镍或者说sputtering（不好意思没有接触过这一行业，不知道这个词要做什么翻译更恰当）选择？

Cynanchum Lingtai apricot production in the average weight 65 grams, the brightly-colored fruit, juicy rich, sweet-sour taste, sweet from the nucleolus, when the late Qing Dynasty famous Shaanxi, Gansu provinces, the Qing imperial court Tongzhi tribute for years.

灵台生产的牛心杏平均单果重65克，果实色泽鲜艳，汁多味浓，甜酸适口，离核仁甜，清末时就驰名陕、甘两省，清同治年间曾为朝廷贡品。

Chenopodium album,Solanum nigrum, and Amaranthus retroflexus were very susceptible to the herbicides. Polygonum persicaria and Abutilon theophrasti were relatively less susceptible to the herbicides, and Lycopersicon esculentum was not susceptible to it. The relationship between reduction rates of weed biomass and PPM values of weed leaves 2,4, and 6 days after treatment was established.

供试的6种杂草对该混剂的敏感性存在显著差异：红心藜Chenopodium album、龙葵Solanum nigrum和反枝苋Amaranthus retroflexus对该混剂最敏感，ED90值分别为47.65、71.67和29.17g/hm2；春蓼Polygonum persicaria和苘麻Abutilon theophrasti敏感，ED90值分别为96.91、114.20g/hm2；而番茄不敏感。