查询词典 etching silk

The making process includes: setting insulating solid film on one horizontal rotating carrier with particle detecting unit and etching with single particle beam in the incident angle of 9.6-90 deg to penetrate the film, shifting the film relatively to the single particle beam and etching for the next time, and so on until the film is rotated by one turn to obtain truncated cone shaped, double turned truncated cone shaped or cylindrical single nanometer hole.

本发明将固体绝缘薄膜置于带有粒子检测装置的一个可水平旋转的载体上，用单粒子束刻蚀该薄膜，单粒子束入射角大于等于9.6°、小于等于90°，并且单粒子束在该薄膜底部、顶部、或二者之间与薄膜旋转轴交叉，待单粒子束完全穿透该薄膜后，固体绝缘薄膜底部的粒子监测器反馈使该薄膜被穿透处与单粒子束相对移动1荆再刻蚀，如此反复，直至固体绝缘薄膜旋转一周，获得圆台形、双倒圆台形或圆筒形的单纳米孔。

In order to overcome the wet etching disadvantage and to minimize the additional waste chemical treatment cost, therefore the purpose of this thesis is to study the customization of the batch type plasma dry etcher for power diode process, to analysis the etching mechanism and build up the simulation model for the distribution of plasma power density that will be fitted with the measurement data.

在此前提下，本论文将以客制化的多片式电浆蚀刻机为研究主体，分析其蚀刻机制并建立电浆能量密度的分析模拟模型，并以实验数据做比对，藉此建立模型模拟数据的可信度。

In silicon deep reactive ion etching using inductively coupled plasma etcher,a narrow trench with a width of several micrometers usually shows positively tapered profile, which means that the width of the etched trench decreases with the progress of etching depth.

利用自感应耦合等离子蚀刻机进行硅深层反应离子刻蚀，得到了几微米宽的狭槽，其轮廓通常为正锥形，即蚀刻槽的宽度随着蚀刻深度的增大而减小。

The method can be carried out in a direct plasma etching process or in a remote plasma etching process.

该方法可以在直接等离子体刻蚀处理中或远程等离子体刻蚀处理中执行。

There was a linear relationship between the etching depth and the etching time.

在刻蚀过程中，刻蚀深度和刻蚀时间呈线性关系。

Reactive ion etching, as one of dry etching technologies, was originated in the 1970's.

作为等离子体干法刻蚀技术的一种，反应离子刻蚀诞生于20世纪70年代。

The electroplated ferronickel shutter is suspended by a silicon spring The shutter is fabricated by the nonsilicon surface micromachining techniques. The planar coil is fabricated by high-aspect-ratio photolithography and mask-plating processes. And the silicon spring and the fiber alignment components are fabricated by the reactive ion etching and by the silicon anisotropic etching process.

电镀铁镍制作的挡光片被固定在一个硅弹簧上，该挡光片采用非硅表面微加工工艺制作，平面电感线圈利用高深宽比的光刻工艺和掩蔽电镀工艺制作，硅弹簧和光纤对准元件采用反应离子刻蚀和硅的各向异性腐蚀工艺制作。

Lindsay etching is frontispiece; his last etching used as a book illustration.

林蚀刻是frontispiece ；他最后蚀刻作为一本书的例证。

Etching metal: etching is a kind of chemical process, which means metal legibility created from copy board.

蚀刻金属：蚀刻是一种化学过程，即金属是从副本的板创造的易读性。

Results indicate that etching rates of BST thin films present non-monotonic dependence on mixing ratio of etching gases.

结果表明，刻蚀速率与刻蚀气体的混合比率呈现非单调特性。

It has to be computed by the host for the actual clock rate.

主控制器可以用来计算实际的时钟速率。

Let's see what you got.

让我看看你的东西