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薄膜形成

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The micro movement of deposited cluster and the microstructure evolution of thin film have been studied in dimension of atom-cluster in this paper. There are some important applications to do deeply research on the migration, coacervation and nucleation of atom cluster, to optimize the deposition process, to enhance the characteristics of thin film.

在原子尺度上揭示膜层形成初期粒子的微观变化过程及膜层微观结构的演化规律,对深入了解表面粒子的迁移、吸附和成核,对改进和优化薄膜生长工艺、提高薄膜质量、改善薄膜性质具有重要意义。

At present, the application in the packaging business card printing and membership card making the UV light oil formation, in addition polymerization, the film uses initiator aggregation and energy initiating two forms (both called conglutinate, that is, light oil system of conglutinate in the ultraviolet radiation occurs under resin polymorization formation of varnish film, known as UV-curing on).

目前,应用在包装制卡和会员卡制作制品上的UV光油,除氧化聚合形成外,薄膜采用引发剂引发聚合和能量引发聚合两种形式(均称为光敏树脂,即光油体系的光敏树脂在紫外线照射下树脂发生聚合反应形成的光油薄膜,称为紫外线固化上光油)。

The results showed that N content increases the sp^3 C-N content and decreases content and decreases the sp^2 C-N. The refractive index and electronic polarization of dielectric constant decreases with increasing N/C ratio.

研究结果表明,随着CN薄膜N/C比的增大,sp^3 C-N的形成受到抑制,sp^2 C-N的形成增多,薄膜折射率以及介电常数电子极化贡献部分降低。

Small height fluctuations were artificially introduced to the thin film samples by mechanically rubbing the sample surface with a rayon cloth before dewetting initiates. By comparing the dewetting morphology evolution and the characteristic length of dewetting structures of unrubbed and rubbed samples, the results clearly show that the dewetting mechanism for thinner polystyrene films with h≤13. 3nm is spinodal dewetting and that for thicker films with h≥13. 3nm is heterogeneous nucleation dewetting.

通过用绒布在薄膜表面进行摩擦,人为的引入一定程度的厚度涨落,通过比较有和没有表面涨落的薄膜的去湿形貌,可以清楚的识别出厚度小于13.3nm的聚苯乙烯薄膜的破坏机理为旋节去湿,而厚度大于13.3nm的聚苯乙烯薄膜的破坏机理则为成核去湿,形成双连续结构或孔洞都可以导致薄膜的旋节去湿。

The results show that the films are characterized by the amorphous microstructure and mainly composed of Si C bondings, C C bondings as well as a small mount of oxide impurity consorted with Si; the content of the C C bondings decreased after annealing in vacuum, meanwhile the Si C bondings content increased, annealing in vacuum is beneficial to the formation of SiC; after annealing at 800 in air, a thin dense layer of SiO2 formed on the surface, which prevented the oxygen from contacting with the film and effectively protected the inner SiC from oxidizing.

结果表明,薄膜主要以非晶为主,由Si--C键, C--C键和少量Si的氧化物杂质组成;在真空条件下经高温退火后,薄膜C--C键的含量减少,而Si--C键的含量增加,真空退火有利于SiC的形成;在800℃空气中退火后,薄膜表面生成一层致密的SiO2薄层,阻止了氧气与薄膜内部深层的接触,有效保护了内部的SiC。

And then to study the both structures' emission characteristic.It was found that the Al-AlN could emit electrons. The two different structures' emission efficiency has prodigious distinction. The first one whose electron emitter film is on the top was much easier to engender the straitens gaps. And it could engender the straitens gaps at larger area than the other one.

经过实验我们发现(1)对于发射层位于电极之上的结构观测到可测量的发射电流(2)当电子发射层位于电极之上,一排电子发射单元的总电阻介于20~150Ω之间时,电形成过程中,给电极间加脉冲电压,在第一个脉冲周期中就能把Al-AlN电子发射薄膜烧断;而对于电子发射层位于电极之下的结构,在电形成过程中,则需要几个脉冲周期之后才能将电子发射薄膜烧断。

In summary, we have shown clearly that the formation of QWS can dramatically influence the growth, the electron density of states near the Fermi level, and the physical properties of thin films, such as superconductivity, thermal expansion and electron-phonon coupling.

总之,在本论文中,我们直接证明了量子阱态的形成显著地改变了薄膜费米面附近的电子态密度,观察到了一系列由于量子阱态的形成而导致的薄膜的有趣性质,如超导电性、热膨胀系数、电声子耦合强度等物理参数的量子振荡。

The crystalline defects of metallic substrate can promote the formation of multi-crystal thin films. In contrast, the films on the Si single crystal are basically amorphous; The hardness of films are mainly determined by N concentration. The highest hardnesses of Si〓N〓 and TiN films ware obtained at 1. 1 of N/Si and 0.96 of N/Ti respectively. The hardness of Si〓N〓 film decreased dramatically when the free silicon atoms present.

发现薄膜中N原子百分含量主要受氮离子束流和氮气分压的控制,随着氮离子束流和氮气分压的提高,N/Si和N/Ti原子比增加;膜的组织结构则主要受轰击离子束压和基体种类的影响,高的轰击束压可以抑制薄膜的择优取向,金属基体上的晶体缺陷使薄膜易于形成多晶,而单晶硅上的薄膜基本上为非晶态;薄膜的硬度受氮含量的影响最大。

To present an adhesive sheet roll for wafer processing excellent in storage stability, radiation curing property, and low contamination to wafer.

一种保存稳定性、放射线固化性以及对晶圆的低污染性优异的筒状晶圆加工用粘合片,是将由基材薄膜、放射线固化性粘合剂层、以及脱模薄膜按顺序层叠而成的层叠薄膜,多重缠绕而形成的筒状晶圆加工用粘合片,所述基材薄膜和/或脱模薄膜的与放射线固化性粘合剂层接触的面的另外面侧表面的轮廓算术平均偏差为1μm以上,且所述放射线固化性粘合剂层中所含的自由基聚合抑制剂的重量低于1000ppm。

At present, the company has completed the film with nano-level and engineering level of the development of nylon and successfully applied to the functional film and the field of urban water supply, developed a multi-layer barrier packaging films, stretch film, high-strength heat shrinkable barrier film series, as well as nano-meter nylon, plastic beer bottles series, films and nylon meter has formed the scale of industrialization.

目前,公司已完成膜用级和工程级纳米尼龙的开发,成功应用到功能性包装薄膜及城市供水领域,开发了多层阻隔包装薄膜、拉伸膜、高强度高阻隔热收缩薄膜系列以及纳米尼龙水表、塑料啤酒瓶系列,薄膜及尼龙水表已形成产业化规模。

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