淀

In conventional conditions, the lowest temperature for SiGe growth is about 550℃.

在双腔超高真空化学气相淀积生长中，通常采用液氮冷却的方法。

Metallization is the process of depositing a thin film of metal and patterning it to form the desired interconnection arrangement.

金属化是淀积一层薄薄的金属膜的工艺，将其制成模版用于形成所需的内部互连排列。

Zirconia filing , deposited by PVD both at 300℃ and the room temperature, show crystalline inhomogeneity after a certain thickness: the tetr, phase exists on the eubstrate side and the monocline on the air side.

无论是在300℃或室温下，用PVD方法淀积的ZrO_2薄膜，达到一定厚度后都出现晶相非均匀性，在基底侧为四方相，空气侧为单斜相。

Watching the black-and-white image of the ogress, which has become scratchy with the passage of time, I remembered the late movie critic Nagaharu Yodogawa, who was born 10 years after the film was shot.

汉］看到因时光流逝而变得模糊不清的女鬼的黑白影像，我想了这部影片拍摄完成10年之后出生的已故电影评论家淀川长治。

Okada thinks it was his way of compelling himself to live to the fullest.

冈田想，这句话大概是驱使淀川竭尽全力活下去的咒语。

Resistance pure water system, 3-waste treatment system, and shock-proof working-table, and about 80 sets of micro-electrical-mechanical technical equipment are installed, including AMS200 ICP plasma etching system, ICP-2B etching machine, AWB04 bonding machine, MA6/BA6 Karlsus double-face photolithography machine/bonding machine, POLI-400 chemical-mechanical-polishing tool, WL2040 aluminum-wire press welder, OPTI CAOT 22i decktop precision spin coasting system, ZSH406 automatic dicing saw system, DQ-500 plasma photoresist-removing machine, HXS150S automatic centrifugal spinner, AXTRON MOCVD metal organic chemical vapor deposit system, 4470 micro-control 4-tube diffusing furnace, type 4371 LPCVD low pressure chemical vapor deposit system, OMICRON MBE molecular beam epitaxy system, JS-3X100B magnet-control spattering equipment, PECVD-2E plasma deposit apparatus, ZZSX500C electron-beam vapor equipment, JC500-3/D magnet-control spattering-coating machine, H63-14/ZM quartz-tube cleaning machine. Measurement instruments include OLS1100 Confocal Laser Scanning Microscope, DEKTAKIII Surface Profiler, D41-11A/ZN 4-probe resistance test instrument, Nikon L150 metallurgical microscope, and so on.

中心现有80多台各种微机电工艺设备，如AMS 200深硅等离子体刻蚀系统、ICP-2B刻蚀机、AWB04键合机、MA6/BA6 Karlsuss双面光刻机和键合机、POLI-400化学机械抛光机、WL2040铝丝压焊机、OPTI CAOT 22i喷涂胶机系统、ZSH406全自动划片机、DQ-500等离子去胶机、全自动清洗甩干机、AXTRON MOCVD金属有机物化学气相沉积系统、4470微控四管扩散炉、4371LPCVD低压化学沉积系统、OMICRON分子束外延系统、JS-3X100B磁控溅射台、PECVD-2E等离子淀积台、ZZSX500C电子束蒸发台、JC500-3/D磁控溅射镀膜机、石英管清洗机，以及多种常用测试仪器，如OLS1100激光共聚焦显微镜、DEKTAK-III台阶测量仪、D41-11A/ZN四探针电阻测试仪、Nikon L150金相显微镜等。

An originative, technological approach that a doped poly-silicon layer is grown on extrinsic base before MBE SiGe base epitaxy is proposed, which minimizes the contact resistance of base and eliminates the native oxide at both internal and extrinsic base pads.

对SiGe HBT器件的性能进行了仔细研究，提出了在进行SiGe基区外延之前淀积掺杂多晶硅的新器件结构，该结构消除了外基区掺杂Poly—Si和基区SiGe接触之间的自然氧化层对基区接触电阻的影响，减少了基区接触电阻。

Pereira's lawyer explained the rationale:"Under Massachusetts law, I'm trying to get compensation for my client anywhere I can."

佩雷拉淀的律师这样解释控诉的逻辑："依据曼彻斯特的的法律，我正尽全力为我的客户从任何可能的地方争取赔偿。"

To May 2004. According to the surveys, 160 taxa of phytoplankton belonging to 68 genera of 8 phyla have been identified, of which the most abundant are of Chlorophyta, with 99 species of 36 genera, taking up 61.88% of the total.

lm，是一个平原浅水湖泊，它不但是上海最大的旅游胜地，也是上海市主要的供水水源之一i'，，〕，对淀山湖的水质调查和水环境保护有着重要的意义。

Planosol is mainly distributed in the East parts of both Heilongjiang and Jilin provinces of China.

白浆土自上而下排列分布着有机质层、白浆层和淀积层。

Chrysanthemum of 10 thousand birthday is lax to edaphic requirement, with the arenaceous qualitative loam with fecund, good drainage had better.

万寿菊对土壤要求不严，以肥沃。排水良好的砂质壤土为好。

He unstepped the mast and furled the sail and tied it.

他拔下桅杆，把帆卷起，系住。