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蚀刻

与 蚀刻 相关的网络解释 [注:此内容来源于网络,仅供参考]

etched Horz

横刻

etched 蚀刻 | etched Horz 横刻 | Etched Printed Circuit 蚀刻印刷电路

etched Horz

水平蝕刻

"蚀箔处理","etched foil process" | "水平蚀刻","etched Horz" | "蚀刻印刷电路","etched printed circuit"

etched Vert

垂直蝕刻

"蚀刻印刷电路","etched printed circuit" | "垂直蚀刻","etched Vert" | "蚀刻导线技术","etched wire technique"

etched Vert

直刻 直刻

etched Horz 横刻 横刻 | etched Vert 直刻 直刻 | etched 蚀刻 蚀刻

photolithography: n.1

照相平版印刷(术) 2.光刻(蚀)法

silicon chip: n.硅(基)片 | photolithography: n.1.照相平版印刷(术) 2.光刻(蚀)法 | etching: n.蚀刻,浸蚀(法)

etched pothole

蚀甌穴;蚀壶穴

蚀像 etch figure | 蚀瓯穴;蚀壶穴 etched pothole | 蚀刻 etching

Reticle

刻线

此外,不仅设计技术不会直接转移至光罩上,光罩刻线(reticle)的形状与刻印在晶圆上的电路也会有所差异,让光罩检验的工作面临严苛的挑战. Numerical的Virtual Stepper软件可支持仿真式的光罩检验作业,能仿真硅组件在光罩以特定蚀刻条件蚀刻后所产生的结果,

undercut

侧蚀

至於另一种半氧化的Cu+则很难水溶,常附著在线路腰部流速较低的侧壁上,可当成护岸剂(Banking Agent),而使侧蚀(Undercut)得以减低. 为了降低水沟效应减少侧蚀与残足起见,5mil以下的细线应尽可能将待蚀刻的铜层逼薄,同时也还应将抗蚀阻剂逼薄.

notching

刻痕

在对硅进行蚀刻时会出现氧化硅等绝缘膜的结构中,沟槽底部的绝缘膜表面发生绝缘物带电,会导致离子偏移,使侧壁的下面部分被蚀刻. 这称为刻痕(Notching). 并且,即使表面为绝缘物,仍可能发生绝缘物带电,从而影响离子的轨迹,使其发生称为侧向偏移(Bowing)的变形.

Etchings and sculptures of men in spacesuits

还有那些蚀刻及雕刻中穿着宇航服的人

Drawings of rockets that look like Apollo launching into the sky.|火箭的... | Etchings and sculptures of men in spacesuits.|还有那些蚀刻及雕刻中穿着宇航服的人 | ...and what look like oxygen masks.|...看...

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The Shop Around the Corner:街角商店

上错天堂投错胎Heaven Can Wait (1943) | 街角商店The Shop Around the Corner (1940) | 妮诺奇嘉Ninotchka (1939)

neigher nor gate:既非又不闸

"邻区最佳控制","neighboring optimal control" | "既非又不闸","neigher nor gate" | "内利亚克编译程式","NELIAC; naval electronics laboratory international algebraic complier"

fight fought:打架

buy bought 买 | fight fought 打架 | think thought 想