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silicide相关的网络例句

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与 silicide 相关的网络例句 [注:此内容来源于网络,仅供参考]

And in this study, we focus on the characteristics of junction formed at low activation temperature by using implant into nickel silicide method.

本篇研究主要著重利用离子布植进入镍矽合金法在低温活化形成的接面特性的相关研究。

In the thesis, we want know the amount of activation and electro-characteristics by different thermal process. The experiments show that nickel silicide interface state

在本文中,我们主要探讨子布植入矽化镍再经由后续同条件的退火制程后,所呈现出的活化及电特性的研究。

Both of the bare Nb silicide based alloy and coated sample were oxidized in an oxidizing furnace at 1250℃ for 5, 10, 20, 50 and 100h respectively.

电弧熔炼态试样和渗硅试样的氧化实验在高温拉伸氧化炉中进行,氧化温度为1250℃,氧化时间分别为5、10、20、50和100h。

Advanced silicide process will be discussed too.

接着是金属以及金属硅化物的学习,包括金属的淀积方法和比较先进的金属硅化物技术。

The thickness of the silicide layer is about 60-80nm.

硅化钇层的厚度大约为60-80nm。

The results show that, the silicide coating is mainly composed of TiSi2 and SiC; one layer of the mixture of SiO2 and TiO2 is formed when the coating is oxidized.

结果表明:渗硅层主要由TiSi2和SiC组成,在空气中氧化时形成了SiO2和TiO2的混合氧化物膜。

The results show that the silicide coating is formed by reactive diffusion and the silicification process obeys parabolic relation. The coating is composed of composite structures including MoSi2 outer layer, two-phase transient zone with major NbSi2 and minor Nb5Si3, and Nb5Si3 diffusion inner layer. The coating possesses good high-temperature oxidation resistance and spalling resistance.

研究结果表明:包渗法制备硅化物涂层是通过反应扩散形成的,硅化过程服从抛物线规律;该涂层为复合结构:MoSi2相为主体层;以NbSi2相为主、并含少量Nb5Si3相的两相为过渡区;Nb5Si3相为扩散层。

The titanium silicide fims were prepared on glass substrate by atmospherical pressure chemical vapor deposition using SiH_4 and TiCl_4 as the precursors and diluted N_2,simulated the technics of coating on line,in the deposition reaction temperature about 640-730℃.

模拟在线镀膜工艺,采用APCVD方法,以普通载玻片作为基板,硅烷(SiH_4)、四氯化钛(TICl_4)为先驱气体,氮气(N2)稀释,沉积反应温度在640~730℃之间,制备硅钛化合物薄膜。

The result demonstrates that only a few phosphides contribute to spontaneous crumbing of the RE silicide alloy by reacting with water and forming oxide or phosphorus oxide. The phosphorus content is not the crucial factor of disintegration of the alloy studied.

结果表明:含磷稀土硅化物合金中只有少部分磷化物能够水化,生成氧化物或含磷氧化物,从而对合金粉化起作用;在本实验研究范围内,磷含量不是稀土硅化物合金粉化的决定因素。

After crystallization silicide is finished, the density of the silicified wood is very high, the hardness can also reach 6.5-7.0 grades, like glass, much harder, similar to the gem (more than 7 grades) than the marble (4 grades), the timber of so high hardness, it can not moved that the wood is sawn, can't saw to cut open with the general stone material either.

在硅化结晶完成之后,硅化木的密度是很高的,硬度也可达到6.5-7.0级,与玻璃一样,比大理石(4级)要硬得多,与宝石7级以上)相似,如此高硬度的木材,木锯是啃不动的,也不能以一般石材来锯剖。

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At first I only know bruck is the idol of American younglings, afterwards I returned back to Taiwan ,even in Beijing last year ,I saw her poster everywhere, I was so surprised at her charm.

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