查询词典 painter etching

Etching metal: etching is a kind of chemical process, which means metal legibility created from copy board.

蚀刻金属：蚀刻是一种化学过程，即金属是从副本的板创造的易读性。

Results indicate that etching rates of BST thin films present non-monotonic dependence on mixing ratio of etching gases.

结果表明，刻蚀速率与刻蚀气体的混合比率呈现非单调特性。

Resistance pure water system, 3-waste treatment system, and shock-proof working-table, and about 80 sets of micro-electrical-mechanical technical equipment are installed, including AMS200 ICP plasma etching system, ICP-2B etching machine, AWB04 bonding machine, MA6/BA6 Karlsus double-face photolithography machine/bonding machine, POLI-400 chemical-mechanical-polishing tool, WL2040 aluminum-wire press welder, OPTI CAOT 22i decktop precision spin coasting system, ZSH406 automatic dicing saw system, DQ-500 plasma photoresist-removing machine, HXS150S automatic centrifugal spinner, AXTRON MOCVD metal organic chemical vapor deposit system, 4470 micro-control 4-tube diffusing furnace, type 4371 LPCVD low pressure chemical vapor deposit system, OMICRON MBE molecular beam epitaxy system, JS-3X100B magnet-control spattering equipment, PECVD-2E plasma deposit apparatus, ZZSX500C electron-beam vapor equipment, JC500-3/D magnet-control spattering-coating machine, H63-14/ZM quartz-tube cleaning machine. Measurement instruments include OLS1100 Confocal Laser Scanning Microscope, DEKTAKIII Surface Profiler, D41-11A/ZN 4-probe resistance test instrument, Nikon L150 metallurgical microscope, and so on.

中心现有80多台各种微机电工艺设备，如AMS 200深硅等离子体刻蚀系统、ICP-2B刻蚀机、AWB04键合机、MA6/BA6 Karlsuss双面光刻机和键合机、POLI-400化学机械抛光机、WL2040铝丝压焊机、OPTI CAOT 22i喷涂胶机系统、ZSH406全自动划片机、DQ-500等离子去胶机、全自动清洗甩干机、AXTRON MOCVD金属有机物化学气相沉积系统、4470微控四管扩散炉、4371LPCVD低压化学沉积系统、OMICRON分子束外延系统、JS-3X100B磁控溅射台、PECVD-2E等离子淀积台、ZZSX500C电子束蒸发台、JC500-3/D磁控溅射镀膜机、石英管清洗机，以及多种常用测试仪器，如OLS1100激光共聚焦显微镜、DEKTAK-III台阶测量仪、D41-11A/ZN四探针电阻测试仪、Nikon L150金相显微镜等。

The invention discloses a method to integrate single CMOS with bulk silicon microelectromechanical system, its technical project: 1 forming isolating groove: adopting deep-groove etching, and SiO2 and polycrystal silicon filling to realize the insulation of MEMS structure and CMOS circuit; 2 making standard CMOS circuit; 3 using SiO2 and Si3N4 as mask, etching silicon on the back until exposing SiO2 at the bottom of the isolating groove, to complete the thickness control for MEMS silicon structure layer; 4 completing metalizing the CMOS circuit and masking the MEMS structure: MEMS structure region uses Al as mask and CMOS circuit region uses thick photoetching glue as mask, using DRIE to release silicon structure.

本发明公开了一种将单片CMOS与体硅微机械系统集成的方法，其技术方案为：1形成隔离槽：采用深槽刻蚀，SiO 2 和多晶硅填充，实现MEMS结构和CMOS电路的绝缘；2完成隔离槽后进行标准CMOS电路的加工；3用SiO 2 和Si 3 N 4 作掩膜，从背面腐蚀硅，直至暴露出隔离槽底部的SiO 2 ，完成MEMS硅结构层的厚度控制；4完成CMOS电路金属化和MEMS结构掩膜：MEMS结构区用铝作掩膜，CMOS电路区用厚光刻胶作掩膜，用DRIE释放硅结构。用本发明方法不仅获得了较大的质量块，而且用本发明较高的深宽比制作出的结构电容，同时实现了体硅微机械与CMOS电路的集成，显著提高MEMS传感器的精度和稳定性，具有前沿性和重要实用价值。

The figure of silicon tips etched in this novel etching solution is rocket tips on right rectangular pyramid rather than unsymmetrical eight sided pyramid etched in other etching solution.

更为重要的是该腐蚀液腐蚀的硅尖异于常规的不对称八棱锥，而是一种半锥角很小的"火箭尖"形状，因此可望获得更好的扫描特性和隧道效应。

A silicon based piezo-electricity socle girder miniature electric generating apparatus is provided with a silica fixing frame, an oxidizing layer, a platinum/titanium lower metallic layer, a piezo-electricity PZT layer, a platinum/titanium upper metallic layer, an electrode insulation protection layer, and a vibrating base; the structure of the silica fixing frame combines the monocrystal silicon wet method etching and dry-etching to process, whose structure is integrated as a whole, and the center part of the structure is in a socle girder shape, which includes a silicium socle girder and a free end mass block; the piezo-electricity power supply device uses a micro-machining technique to integrally machine, and can realize the integration of the power supply and the microelectronic devices.

一种硅基压电悬臂梁微型发电装置，有硅质固定框架1、氧化层2、铂/钛下金属层3、压电PZT层4、铂/钛上金属层5、电极绝缘保护层6、振动底座7构成；硅质固定框架1的结构是利用单晶硅湿法腐蚀和干法腐蚀相结合完成加工，其结构连为一体，其中心部分的结构为悬臂梁形状，包括硅悬臂梁a和自由端质量块b；压电电源装置利用微加工工艺集成加工，能够很好的实现电源、微电子器件集成。

Firstly, the theory and knowledge of sparking and burning are briefly introduced. The holistic project of this experiment is designed aiming to the experiment motive. And then the micro-process technique on silicon is chosen. According to the technique, the structure and size of the micro chamber, the spark device, the gas-fired channels are designed. The mask of lithography is produced based on the design. At last, the whole burning room is produced by the techniques of photolithography, deposition, dry etching, wet etching, lift off, etc.

本文首先介绍了点火燃烧的有关原理和基本知识，然后根据提出的实验研究目标，确定了微小空间内点火特性实验总体方案，之后结合拟采用的硅微加工工艺设计确定了微燃烧室、放电点火装置、燃气通道等各部件的结构尺寸，并最终得到光刻用掩膜版图形，最后分别采用光刻、淀积、干法刻蚀、湿法刻蚀、剥离等硅微加工技术完成了实验用微燃烧室的制作。

Parabolic relation between the etching rate of AlGaAsSb materials and their Al content was found, unselective etching could be performed for GaSb and AlGaAsSb material with certain Al content.

实验中发现该腐蚀液对AlGaAsSb的腐蚀速率与其Al组份呈抛物线关系，在合适的Al组份下可对AlGaAsSb和GaSb两种材料进行非选择性的刻蚀。

A process of etching capable of producing several tones by varying the etching time of different areas of a copper plate so that the resulting print resembles the flat tints of an ink or wash drawing .

细点腐蚀制板一种，通过改变铜版不同区域的时间可产生多种色度，以致使印迹类似于墨水画或淡彩画的无明暗之分的色度

A process of etching capable of producing several tones by varying the etching of different areas of a copper so that the resulting print resembles the flat tints of an ink or wash drawing .

细点腐蚀制法一种蚀刻法，通过改变铜版不同区域的蚀刻时间可产生多种，以致使印迹类似于墨水画或淡彩画的无明暗之分的

Chimborazo and Cotopaxi, took me by the hand.

越过琴博腊索山和科托帕克西山。

This car is in a good condition.

这辆车的状况很好。