查询词典 etching ground

The technology process and mechanism of etching are also discussed in detail with examples of hollowing board process.

结合镂空板工艺实例，详细介绍了工艺过程，并讨论了取得的效果与蚀刻机理。

In LOCOS dry etching,silicon loss maintained at about 100 - 200 A,pad oxide layer reduced from 300 A to 135 A,and LOCOS oxide thickness change from 5000 A to 4000 A.

在LOCOS干法刻蚀时，对硅的刻蚀深度保持在100-200左右，衬垫氧化层从300减少到135，LOCOS热氧化厚度从5000？

In addition, an improved rough fabrication method called "photo etching" is developed to enhance the milling efficiency for prefabricating the rectangular micropillars which can be polished through the FIB microscope for the finishing step.

压缩变形后SEM观察发现在(01 0)柱面出现平行的滑移线，在(0001)基面出现成60o相交的滑移线。迹线分析表明：当加载面为(2 0)时，两组滑移系(10 0)[1 10]和(1 00)[11 0] 同时开动。

As the feature size decreases below the wavelength of the illumination system, the diffraction and other effects arising from resist developing and etching causes more and more distortion in the pattern transfer process. Today, new chips with very small feature size can not be manufactured without the support of RETs, OPC is one of the most important technologies in such RETs.

随着集成电路的特征尺寸逐渐下降到光刻所用的光源波长之下，由于光的衍射和光刻胶显影蚀刻等因素带来的不可避免的影响，硅片上实际印制出来的图形与设计图形不再一致，这使得如今的制造工艺已经离不开RET技术的支持，而OPC则是RET技术中的一项重要内容。

Titanium surface becomes roughened with the increasing of the etching current.

随刻蚀电流增大，钛表面的粗糙度随之增大。

The chemical etching leads to a roughening of the surface because widened grain boundaries.

硝酸磷酸腐蚀过程中多晶CdTe薄膜表面出现颜色的变化，并伴随气泡的生成。

EPMA analysis indicates that zinc segregates on the 6063 alloy with higher zinc content during etching in caustic soda solution.

利用EPMA对表面进行成分分析发现，在碱洗过程中，锌含量较高的型材表面出现锌富集现象。

Theoretical analysis and experimental results show that compared with the mixed-reagent-etching, this method smoothes the etched surface effectively.

实质上是采用微处理再进行混合液相激光辅助下的腐蚀。

Wet etching is always followed by a an acetone or alcohol rinse, which in turn is followed by a DI water rinse.

湿蚀刻总是随后一丙酮或酒精冲洗，而这又是由离子水冲洗进行。

Acid resist: An acid-proof protective coating applied to metal plates prior to etching designs thereon.

抗触膜：在触刻图案前涂在金属版面上的抗蚀保护剂。

I go to school at night.

我是上上学。

Clear Tip Nasal Aspirator: A soft time and gentle suction action makes removing excess mucus easy.

鼻吸明确提示：一个柔软的时间和温柔吸力行动使消除过剩的粘液容易。