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By low temperature (145K) deposition method, we prepared such flat Pb films on the Si (111) substrate over a wide thickness range (from 10ML to 32ML). The unique growth behaviors were investigated by RHEED, STM and ARPES. A critical thickness of 10ML is established, at which the atomically flat Pb films become stable at room temperature. Between 10ML and 20ML, the growth exhibits a quasi bi-layer growth mode. Above 21ML, a layer-by-layer growth mode was observed.

采用低温生长的方法（衬底温度145K），通过对生长条件的优化，我们在Si（111）衬底上制备出了具有原子级平整度的Pb 薄膜，用STM 和ARPES确定了其特殊的生长模式：室温下成膜的临界厚度是10ML，随后是一种双层生长模式，覆盖度高于21ML 时，薄膜生长基本上是层状生长的模式。

To make nanostructures, we used surfaces of highly oriented pyrolytic graphite due to its easily refreshable and atomically flat surface.

高同向性热解石墨具有易制备新鲜表面，且容易取得大范围原子级平整区域的优点。

After explaining total design of automated test system for microcircuit , the thesis introduces GPIB standard .

文章在说明了微电路模块自动测试系统的总体设计后，对GPIB标准进行了介绍。

He interceded in my behalf.

他替我说情。